Sop #12

Title: Photomask Cleaning

Purpose:  To clean contaminated masks or ones with residue left on them
          prior to re-use.

Preparation:
1.   Pour 2-Propanol into container marked for this purpose.

2.   Mix Kodak Photo Flo Solution by pouring a few drops of the Photo 
     Flo 200 into the beaker half filled with DI water. 
     (The ratio of Photo Flo 200 to water is about 1 to 200.)
      
Procedure:
1.   Rinse the mask in running DI water for about 2 mins.

2.   Soak the mask in 2-Propanol for 10 mins.

3.   Rinse the mask in running DI water for about 2 mins.

4.   Soak the mask in Photo Flo Solution for 2 minutes.

5.   Dip the fiber swab in the Photo Flo Solution and scrub both sides of 
     the mask till it appears clear.

6.   Repeat step 4

7.   Rinse the mask in running DI water for 5 mins.

8.   Thoroughly blow dry the mask with nitrogen gun.